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Nanometer CMOSFebruary 2008
Publisher:
  • World Scientific Publishing Co., Inc.
  • 1060 Main Street Suite 1B River Edge, NJ
  • United States
ISBN:978-981-270-709-3
Published:01 February 2008
Pages:
300
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Abstract

This book gives a comprehensive overview of all the important issues concerning modern Si MOSFETs. It covers the principles of MOSFET operation, theory, scaling issues, and an in-depth discussion of nanometer MOSFETs. Both classical nanometer MOSFETs as well as non-classical MOSFET concepts, which receive little coverage in textbooks, are treated in detail. The device structures, merits, and drawbacks of MOSFET concepts like strained Si MOSFETs, ultra-thin body SOI MOSFETs, and multiple gate MOSFETs (FinFETs, Tri-gate MOSFETs) are presented. An entire chapter is devoted to the emerging and rapidly growing field of RF MOSFETs/RF CMOS, and the discussion extends to the important future trends in of nanometer CMOS technology and the problems and limits of scaling.

Contributors
  • Technical University of Ilmenau

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