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ACM SIGPLAN Notices Volume 11 Issue 7July 1976pp 25–33https://doi.org/10.1145/987491.987494

Published:01 July 1976Publication History

ACM SIGPLAN Notices

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Basic research on micro processing characteristics of reverse lift-off process
2018 International Symposium on Micro-NanoMechatronics and Human Science (MHS)
In micro electromechanical systems(MEMS) technology, lift-off processes are general patterning methods for the formation of amorphous alloy thick film structures. However, thicknesses of structures fabricated in this method are not uniform and cross-...
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ACM SIGPLAN Notices Volume 11, Issue 7
July 1976
52 pages
ISSN:0362-1340
EISSN:1558-1160
DOI:10.1145/987491
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Copyright © 1976 Author
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Association for Computing Machinery
New York, NY, United States
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- Published: 1 July 1976
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ACM SIGPLAN Notices

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Basic research on micro processing characteristics of reverse lift-off process

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Design notes for TINY BASIC

ACM SIGPLAN Notices

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GM Notes: Tabletop Gaming Themed Discreet Internet Website Password Organizer Book

Sermon Notes Journal: With Calendar 2018-2019, Creative Workbook with simple Guide to Journaling size 8.5x11 Inches Extra Large Made In USA (Volume 1)

Basic research on micro processing characteristics of reverse lift-off process

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