Nathan Hurst
ABSTRACT
Given possibly non-rectangular shapes, S1, ..., Sn, and some English text, T, we give methods based on approximating T by its area that determine for each Si whether T definitely fits in Si, definitely does not fit in Si, or probably fits in Si. These methods have complexity linear in the size of Si, assuming it is represented as a trapezoid list, but do not depend on the size of T. They require a linear time shape independent pre-processing of the text.
- M. de Berg, M. van Kreveld, M. Overmars, and O. Schwarzkopf. Computational geometry : algorithms and applications. Springer, 2nd edition, 2000. Google Scholar
Digital Library
- E. Goldenberg. Automatic layout of variable-content print data. Technical Report 286, Hewlett-Packard Laboratories, Oct. 2002.Google Scholar
- N. Hurst, K. Marriott, and D. Albrecht. Solving the simple continuous table layout problem. In DocEng '06: Proceedings of the 2006 ACM symposium on Document engineering, pages 28--30, New York, NY, USA, 2006. ACM Press. Google ScholarDigital Library
- N. Hurst, K. Marriott, and P. Moulder. Toward tighter tables. In DocEng '05: Proceedings of the 2005 ACM symposium on Document engineering, pages 74--83, New York, NY, USA, 2005. ACM Press. Google ScholarDigital Library
- N. Hurst, K. Marriott, and P. Moulder. Minimum sized text containment shapes. In DocEng '06: Proceedings of the 2006 ACM symposium on Document engineering, pages 3--12, New York, NY, USA, 2006. ACM Press. Google ScholarDigital Library
- K. Marriott, P. Moulder, and N. Hurst. Automatic float placement in multi-column documents. In DocEng '07: Proceedings of the 2007 ACM symposium on Document engineering, New York, NY, USA, 2007. ACM Press. Google ScholarDigital Library
Index Terms
- Approximating text by its area
Recommendations
A large area bimaterial sheet of piezoelectric nanogenerators for energy harvesting: Effect of RF sputtering on ZnO nanorod
In this work, we have developed an optimal radio frequency (RF) sputtering process (sputtering power, sputtering time, and target type) to grow a ZnO seed layer on an indium tin oxide (ITO) glass followed by the hydrothermal growth of a well-aligned ...
Influence of anode area and electrode gap on the morphology of TiO2 nanotubes arrays
Special issue on Self-Assembly Techniques for NanofabricationIn order to fabricate the titanium dioxide (TiO2) nanotubes arrays which were used in the photocatalytic degradation of total volatile organic compounds (TVOC) by anodization, the influence of the electrode gap and anode area on the morphology of the ...
Large area silicon epitaxy using pulsed DC magnetron sputtering deposition
Pulsed DC magnetron sputtering is used for the deposition of large area crystalline (200mm) silicon 100nm thin films. p doped Si substrates are flashed (Ts=900 C) under high vacuum (5í 10-6Pa) for removing native oxide and restoring surface ...
Comments